ARC’s new Zeiss Crossbeam 550 FIB-SEM is now fully installed and operational in Yates 101. Unlike a conventional SEM, this unique three-beam system integrates an electron beam for high-resolution imaging, a focused gallium ion beam for nanoscale milling, and an ultrafast femtosecond laser for rapid removal of large volumes of material. Together, these complementary beams enable researchers to seamlessly transition from fast bulk material removal to precise, site-specific nanoscale machining and imaging within a single instrument.

What This Enables

● Preparation of ultra-thin TEM lamella

● Cross-sectioning of materials and devices

● Visualization of buried interfaces and internal microstructures

● Analysis of subsurface defects and failure mechanisms

● Three-dimensional serial section reconstruction and tomography

● Rapid, large-volume material removal using the integrated femtosecond laser, followed by precise nanoscale milling with the FIB

● Fabrication and modification of microscale and nanoscale structures

Who Can Benefit

This three-beam capability supports research across a wide range of materials, including:

• Batteries
• Semiconductors
• Metals
• Biomaterials
• Tissues
• Advanced manufacturing materials

Interested in using the FIB-SEM for your research? Users can request training or full-service analysis through iLab or by contacting [email protected]